LexDanaLexDanabeta
Inventor

LINGYI GUO

Inventor
CN

Overview

2→
Patents
2024–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y02PClimate change mitigation technologies in the production or processing of goods20%
PatentTitleYear
12,288,725Critical dimension error analysis method202511,874,102Thick photo resist layer metrology target2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024Patents assigned to KLA CORP (1)· patent assignee history
2024–2025Based in CN· patent location history
2025Patents assigned to SHANGHAI IC R&D CT CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KLA CORP12024
SHANGHAI IC R&D CT CO LTD12025
Locations
LocationPatentsSpan
CN22024–2025