Inventor

Chin-Cheng Chang

Inventor

Taichung, TW

Overview

2014–2020

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary

H10DInorganic electric semiconductor devices23%

F16KValves15%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%

C30BSingle-crystal growth8%

F17CVessels for containing or storing compressed, liquefied or solidified gases8%

G01FMeasuring volume, volume flow, mass flow or liquid level8%

H01LSemiconductor devices8%

H10HInorganic light-emitting semiconductor devices having potential barriers8%

Y10TTechnical subjects covered by former us classification8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2014Patents assigned to CHANG CHIN-CHENG (3)· patent assignee history

2014Patents assigned to CHEN CHI-MING (2)· patent assignee history

2014–2016Patents assigned to GRAND GAS EQUIPMENT INC (2)· patent assignee history

2014Patents assigned to HWANG HO-YUNG DAVID (2)· patent assignee history

2014Patents assigned to LIN HUNG-TA (2)· patent assignee history

2014–2020Based in Taichung, TW· patent location history

2014–2017Based in New Taipei, TW· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Taichung, TW	3	2014–2020
New Taipei, TW	3	2014–2017