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Inventor

Satoshi Umehara

Inventor
Tokyo, JP

Overview

4→
Patents
1998–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
C23CCoating metallic material20%
H01FMagnets20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
PatentTitleYear
9,312,099'Charged particle beam device and method for analyzing defect therein'20166,099,706'Magnetic film forming apparatus which applies a parallel magnetic field across a substrate'20005,861,792'Coil component and method of stamping iron core used therefor'19995,783,055'Multi-chamber sputtering apparatus'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2000Patents assigned to HITACHI LTD (2)· patent assignee history
1998Based in Hitachioota, JP· patent location history
1999Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (1)· patent assignee history
1999Based in Matsusaka, JP· patent location history
2000Based in Hitachi, JP· patent location history
2016Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history
2016Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD21998–2000
HITACHI HIGH TECH CORP12016
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11999
Locations
LocationPatentsSpan
Tokyo, JP12016
Hitachi, JP12000
Matsusaka, JP11999
Hitachioota, JP11998