Inventor
Uwe Dersch
Inventor
Dresden, DE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices33%
H10DInorganic electric semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G01RMeasuring electric variables8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,147,659Method and structure for process limiting yield testing201810,048,311Detection of gate-to-source/drain shorts20189,786,657'Semiconductor structure including a transistor including a gate electrode region provided in a substrate and method for the formation thereof'20179,257,353'Integrated circuits with test structures including bi-directional protection diodes'20167,354,684'Test pattern and method of evaluating the transfer properties of a test pattern'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008Patents assigned to ADVANCED MASK TECHNOLOGY CT GMBH (1)· patent assignee history
2008–2018Based in Dresden, DE· patent location history
2016–2018Patents assigned to GLOBALFOUNDRIES INC (4)· patent assignee history
2017–2018Based in Moritzburg, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GLOBALFOUNDRIES INC | 4 | 2016–2018 |
| ADVANCED MASK TECHNOLOGY CT GMBH | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dresden, DE | 3 | 2008–2018 |
| Moritzburg, DE | 2 | 2017–2018 |