Inventor
Kiyoshi Uchikawa
Inventor
Tokyo, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein15%
G02BOptical elements, systems or apparatus13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
G03GElectrography5%
G11BInformation storage based on relative movement between record carrier and transducer5%
G01BMeasuring length, thickness or similar linear dimensions3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G06KGraphical data reading3%
G06NComputing arrangements based on specific computational models3%
PatentTitleYear
10,904,471Feature extraction element, feature extraction system, and determination apparatus20219,017,583'Photosensitive resin composition, and light blocking layer and liquid crystal display using the same'20158,758,654'Photosensitive resin composition for color filter and color filter using the same'20148,111,378'Exposure method and apparatus, and device production method'20127,876,452'Interferometric position-measuring devices and methods'20116,485,870'Charged-particle-beam microlithography masks and methods for manufacturing same'20026,385,186'Down-traffic-signal transmission system'20026,376,153'Photopolymerizable composition for color filter'20026,265,116'Process for producing color filter'20016,010,824'Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same'20005,908,720'Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof'19995,714,286'Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof'19985,636,195'Optical recording method and reproducing method and recording apparatus and reproducing apparatus utilizing stimulated photon echo'19975,589,936'Optical measuring apparatus for measuring physichemical properties'19965,568,460'Optical recording and/or reproducing apparatus and method utilizing stimulated photon echo'19965,498,498'Photosensitive resin composition used in a method for forming a light-shielding film'19965,368,991'Photosensitive resin composition for use as a light-shielding film which can be used as black matrices'19944,652,090'Dispersed iridium based complementary electrochromic device'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history
1987–2002Based in Tokyo, JP· patent location history
1994–2002Patents assigned to TOKYO OHKA KOGYO CO LTD (7)· patent assignee history
1994–2002Based in Kanagawa, JP· patent location history
1996–2021Patents assigned to NIKON CORP (7)· patent assignee history
1998–1999Based in Koza-gun, JP· patent location history
2002Patents assigned to NEC CORP (1)· patent assignee history
2002–2021Based in Tsukuba, JP· patent location history
2014–2015Patents assigned to CHEIL IND INC (2)· patent assignee history
2014–2015Based in Uiwang-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 7 | 1996–2021 |
| TOKYO OHKA KOGYO CO LTD | 7 | 1994–2002 |
| CHEIL IND INC | 2 | 2014–2015 |
| NEC CORP | 1 | 2002 |
| NIPPON KOGAKU KK | 1 | 1987 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 1987–2002 |
| Kanagawa, JP | 5 | 1994–2002 |
| Tsukuba, JP | 4 | 2002–2021 |
| Uiwang-si, KR | 2 | 2014–2015 |
| Koza-gun, JP | 2 | 1998–1999 |