Inventor
Naomichi Abe
Inventor
Tokyo, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
C23CCoating metallic material8%
H02NElectric machines not otherwise provided for8%
PatentTitleYear
5,998,104'Method of stripping a resist mask'19995,961,775'Apparatus for removing organic resist from semiconductor'19995,773,201'Method of stripping a resist mask'19985,194,364'Process for formation of resist patterns'19935,030,316'Trench etching process'19915,017,461'Formation of a negative resist pattern utilize water-soluble polymeric material and photoacid generator'19914,384,918'Method and apparatus for dry etching and electrostatic chucking device used therein'1983Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1983–1999Patents assigned to FUJITSU LTD (7)· patent assignee history
1983–1999Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 7 | 1983–1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 1983–1999 |