Inventor

Wilbert Jan Mestrom

Inventor
Roermond, NL

Overview

7→
Patents
2013–2019
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
H05GX-ray technique25%
Y10TTechnical subjects covered by former us classification13%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids8%
G21KHandling of particles or ionising radiation not otherwise provided for8%
B03CMagnetic or electrostatic separation of solid materials from solid materials or fluids4%
B05BSpraying apparatus4%
B08BCleaning in general4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2019Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2013–2015Patents assigned to MESTROM WILBERT JAN (3)· patent assignee history
2013–2015Patents assigned to SWINKELS GERARDUS HUBERTUS PETRUS MARIA (3)· patent assignee history
2013–2015Patents assigned to LOOPSTRA ERIK ROELOF (2)· patent assignee history
2013–2019Based in Roermond, NL· patent location history
2015Patents assigned to BRULS RICHARD JOSEPH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV72013–2019
MESTROM WILBERT JANself32013–2015
SWINKELS GERARDUS HUBERTUS PETRUS MARIA32013–2015
LOOPSTRA ERIK ROELOF22013–2015
BRULS RICHARD JOSEPH12015
Locations
LocationPatentsSpan
Roermond, NL72013–2019