Inventor

Lawrence S. Melvin, III

Inventor

Hillsboro, OR, US

Overview

2007–2021

Patent span

Physics

Primary field (CPC G)

Patents· 40 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices51%

G06FElectric digital data processing21%

Y02PClimate change mitigation technologies in the production or processing of goods14%

G05BControl or regulating systems in general3%

Y10TTechnical subjects covered by former us classification3%

B82YSpecific uses or applications of nanostructures1%

G02BOptical elements, systems or apparatus1%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%

G06TImage data processing or generation, in general1%

H01LSemiconductor devices1%

PatentTitleYear

11,093,680Design-prioritized mask correction2021 10,915,031Optical source compensation2021 10,852,635Compact modeling for the negative tone development processes2020 10,365,557Compact OPC model generation using virtual data2019 9,940,694Resolution enhancement techniques based on holographic imaging technology2018 8,473,271'Fast photolithography process simulation to predict remaining resist thickness'2013 8,184,897'Method and apparatus for determining an optical threshold and a resist bias'2012 8,181,128'Method and apparatus for determining a photolithography process model which models the influence of topography variations'2012 8,136,054'Compact abbe\'s kernel generation using principal component analysis'2012 7,973,909'Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography'2011 7,966,582'Method and apparatus for modeling long-range EUVL flare'2011 7,934,174'Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout'2011 7,934,176'Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profile'2011 7,933,471'Method and system for correlating physical model representation to pattern layout'2011 7,853,919'Modeling mask corner rounding effects using multiple mask layers'2010 7,788,630'Method and apparatus for determining an optical model that models the effect of optical proximity correction'2010 7,784,018'Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model'2010 7,743,357'Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile'2010 7,739,645'Method and apparatus for determining a process model using a 2-D-pattern detecting kernel'2010 7,739,651'Method and apparatus to determine if a pattern is robustly manufacturable'2010 7,727,687'Method and apparatus for determining whether a sub-resolution assist feature will print'2010 7,721,246'Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout'2010 7,707,539'Facilitating process model accuracy by modeling mask corner rounding effects'2010 7,584,450'Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout'2009 7,509,621'Method and apparatus for placing assist features by identifying locations of constructive and destructive interference'2009 7,509,624'Method and apparatus for modifying a layout to improve manufacturing robustness'2009 7,496,880'Method and apparatus for assessing the quality of a process model'2009 7,494,751'Method and apparatus for improving depth of focus during optical lithography'2009 7,491,479'Compensating for effects of topography variation by using a variable intensity-threshold'2009 7,475,382'Method and apparatus for determining an improved assist feature configuration in a mask layout'2009 7,454,739'Method and apparatus for determining an accurate photolithography process model'2008 7,451,068'Method and apparatus for generating an OPC segmentation based on modeled intensity gradients'2008 7,421,678'Assist feature placement using a process-sensitivity model'2008 7,320,119'Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model'2008 7,315,999'Method and apparatus for identifying assist feature placement problems'2008 7,308,673'Method and apparatus for correcting 3D mask effects'2007 7,260,812'Method and apparatus for expediting convergence in model-based OPC'2007 7,251,806'Model-based two-dimensional interpretation filtering'2007 7,251,807'Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity model'2007 7,243,332'Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2021Patents assigned to SYNOPSYS INC (40)· patent assignee history

2007–2021Based in Hillsboro, OR, US· patent location history

2012–2013Patents assigned to MELVIN III LAWRENCE S (4)· patent assignee history

2012Patents assigned to CHEN CHARLIE CHUNG-PING (1)· patent assignee history

2012Patents assigned to HUANG JENSHENG (1)· patent assignee history

2013Patents assigned to ISOYAN ARTAK (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SYNOPSYS INC	40	2007–2021
MELVIN III LAWRENCE Sself	4	2012–2013
CHEN CHARLIE CHUNG-PING	1	2012
HUANG JENSHENG	1	2012
ISOYAN ARTAK	1	2013

Locations

Location	Patents	Span
Hillsboro, OR, US	40	2007–2021