Inventor

Gen Ogawa

Inventor

Okazaki, JP

Overview

2004–2015

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary

Y10TTechnical subjects covered by former us classification25%

B23BTurning19%

C07CAcyclic or carbocyclic compounds13%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%

G02BOptical elements, systems or apparatus13%

B23DPlaning6%

B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling6%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2004–2015Patents assigned to FUJI MACHINE MFG (4)· patent assignee history

2004–2005Patents assigned to ASAHI GLASS CO LTD (2)· patent assignee history

2004–2015Based in Okazaki, JP· patent location history

2004–2005Based in Kanagawa, JP· patent location history

2006Based in Chiryu, JP· patent location history

2013–2015Patents assigned to OGAWA GEN (2)· patent assignee history

2015Patents assigned to ISOZUMI JOJI (1)· patent assignee history

2015Patents assigned to NAGAI OSAMU (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations