Inventor

Juyeon Chang

Inventor

Hwaseong-si, KR

Overview

2011–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary

C09GPolishing compositions14%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

H01LSemiconductor devices9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%

B24BMachines, devices, or processes for grinding or polishing5%

B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units5%

B82YSpecific uses or applications of nanostructures5%

C01BNon-metallic elements5%

C01GCompounds containing metals not covered by subclasses c01d or c01f5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to UNIV SUNGKYUNKWAN FOUND (1)· patent assignee history

2011Based in Seoul, KR· patent location history

2017–2020Patents assigned to CABOT MICROELECTRONICS CORP (3)· patent assignee history

2017–2020Based in Hwaseong-si, KR· patent location history

2020Based in Yongin-si, KR· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CABOT MICROELECTRONICS CORP	3	2017–2020
UNIV SUNGKYUNKWAN FOUND	1	2011

Locations