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Inventor

Yoshiki Aruga

Inventor
Tokyo, JP

Overview

5→
Patents
1996–2011
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
F16KValves9%
H02NElectric machines not otherwise provided for9%
PatentTitleYear
7,944,677'Electrostatic chuck'20116,251,232'Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus'20016,027,618'Compact in-line film deposition system'20005,846,328'In-line film deposition system'19985,560,586'Main valve'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2001Patents assigned to ANELVA CORP (4)· patent assignee history
1996Based in Tama, JP· patent location history
1998–2001Based in Tokyo, JP· patent location history
2011Patents assigned to CANON ANELVA CORP (1)· patent assignee history
2011Based in Hachioji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANELVA CORP41996–2001
CANON ANELVA CORP12011
Locations
LocationPatentsSpan
Tokyo, JP31998–2001
Hachioji, JP12011
Tama, JP11996