Inventor

Ichiro Kaneko

Inventor

Ibaraki, JP

Overview

1978–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 52 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds40%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%

H04BTransmission6%

H04WWireless communication networks6%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

C08LCompositions of macromolecular compounds3%

C09DCoating compositions, e.g. paints, varnishes or lacquers3%

G06VImage or video recognition or understanding3%

H03HImpedance networks, e.g. resonant circuits3%

PatentTitleYear

10,827,559Base station system2020 10,517,143Base station system2019 10,039,155Base station system2018 9,439,241'Base station system'2016 7,206,562'Cross polarized wave interference eliminating system and method'2007 6,730,453'High molecular weight silicone compounds, resist compositions, and patterning method'2004 6,511,778'Phase shift mask blank, phase shift mask and method of manufacture'2003 6,309,796'High molecular weight silicone compounds resist compositions, and patterning method'2001 6,066,433'High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method'2000 5,972,560'High molecular weight silicone compound, chemically amplified positive resist composition and patterning method'1999 5,920,594'Transversal filter capable of processing an input signal of high data rate'1999 5,793,806'Transversal filter capable of processing an input signal high data rate'1998 5,772,925'Anti-reflective coating composition'1998 5,494,991'Polyimides and processes for preparing the same'1996 5,478,914'Polyimides and processes for preparaing the same'1995 5,431,288'Mail sorting apparatus'1995 5,298,220'Method of preventing polymer scale formation'1994 5,294,684'Process for producing vinyl chloride resin'1994 5,292,836'Preparation of vinyl chloride polymers using high-speed and low-speed shear agitation'1994 5,286,796'Method for the preparation of polyvinyl chloride resin'1994 5,253,303'Character recognizing method and apparatus thereof'1993 5,248,733'Process for producing matte vinyl chloride polymers'1993 5,235,012'Method for polymerizing vinyl chloride with controlled water addition'1993 5,229,471'Method of preventing polymer scale deposition and polymer scale preventive agent'1993 5,214,112'Method of preventing polymer deposition and polymer scale preventive agent'1993 5,214,113'Method of preventing polymer scale deposition and polymer scale preventive agent'1993 5,196,164'Method of preventing polymer scale formation'1993 5,130,386'Method of preventing polymer scale deposition during polymerization'1992 5,115,051'Method of preventing polymer scale deposition in a polymerization vessel'1992 5,112,682'Primer for improving adhesion to plastics'1992 5,098,968'Method of preventing polymer scale deposition'1992 5,067,137'Adjacent channel interference canceller with means for minimizing intersymbol interference'1991 5,053,466'Method of preventing polymer scale deposition'1991 5,037,904'Method of preventing polymer scale deposition'1991 5,034,477'Method of preventing polymer scale formation'1991 5,034,478'Method of preventing polymer scale formation'1991 4,975,974'Character recognition apparatus'1990 4,933,399'Method of preventing polymer-scale formation'1990 4,877,535'Iron dispersant for boiler water'1989 4,758,639'Process for production of vinyl polymer'1988 4,757,124'Process for production of vinyl chloride polymer'1988 4,708,890'Method for preventing polymer scale deposition on the reactor walls in the polymerization of ethylenically unsaturated monomers'1987 4,622,245'Method for preventing polymer scale deposition in the polymerization of an ethylenically unsaturated monomer'1986 4,612,354'Method for preventing polymer scale deposition in the polymerization of a vinylic monomer'1986 4,591,391'Method for removing polymer scale deposited on reactor walls and a polymer scale remover agent therefor'1986 4,543,382'Plastic magnets impregnated with a dye-coated magnet alloy powder'1985 4,542,195'Method for preventing polymer scale deposition in the polymerization of an ethylenically unsaturated monomer'1985 4,539,230'Method for preventing deposition of polymer scale and a coating agent therefor'1985 4,528,336'Method for preventing polymer scale deposition in polymerization of ethylenically unsaturated monomers'1985 4,272,622'Method for preventing polymer scale deposition in the polymerization of an ethylenically unsaturated monomer in an aqueous medium'1981 4,173,696'Method for the polymerization of vinyl monomers'1979 4,090,015'Method for polymerizing dienic monomers'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–2004Patents assigned to SHINETSU CHEMICAL CO (39)· patent assignee history

1981–2000Based in Ibaraki, JP· patent location history

1989Patents assigned to KURITA WATER IND LTD (1)· patent assignee history

1989Patents assigned to OTSUKA CHEMICAL CO LTD (1)· patent assignee history

1990–2020Patents assigned to NEC CORP (11)· patent assignee history

1990–2020Based in Tokyo, JP· patent location history

1991–1994Based in Hazaki, JP· patent location history

1998–2003Based in Nishikamo-gun, JP· patent location history

1999–2004Based in Kashima, JP· patent location history

2016Patents assigned to KANEKO ICHIRO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SHINETSU CHEMICAL CO	39	1978–2004
NEC CORP	11	1990–2020
KANEKO ICHIROself	1	2016
KURITA WATER IND LTD	1	1989
OTSUKA CHEMICAL CO LTD	1	1989

Locations

Location	Patents	Span
Ibaraki, JP	21	1981–2000
Tokyo, JP	11	1990–2020
Hazaki, JP	11	1991–1994
Kashima, JP	3	1999–2004
Nishikamo-gun, JP	2	1998–2003