Inventor
Michael Rennie
Inventor
Mechanicsville, VA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices22%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1022%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10NElectric solid-state devices not otherwise provided for16%
H10DInorganic electric semiconductor devices10%
H10BElectronic memory devices6%
H01PWaveguides2%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution2%
PatentTitleYear
10,985,059Preclean and dielectric deposition methodology for superconductor interconnect fabrication202110,763,419Deposition methodology for superconductor interconnects202010,608,159Method of making a superconductor device202010,312,141Preclean methodology for superconductor interconnect fabrication201910,312,142Method of forming superconductor structures201910,276,504Preclean and deposition methodology for superconductor interconnects201910,158,062Superconductor device interconnect201810,003,005Superconductor device interconnect20189,812,445'Bipolar junction transistor device having base epitaxy region on etched opening in DARC layer'20179,780,285'Superconductor device interconnect structure'20179,142,546'Method of making bipolar junction transistor by forming base epitaxy region on etched opening in DARC layer'20158,551,856'Embedded capacitor and method of fabricating the same'20138,409,950'Method for integrating SONOS non-volatile memory into a sub-90 nm standard CMOS foundry process flow'20137,402,487'Process for fabricating a semiconductor device having deep trench structures'20087,208,326'Edge protection process for semiconductor device fabrication'20076,927,462'Method of forming a gate contact in a semiconductor device'20056,174,787'Silicon corner rounding by ion implantation for shallow trench isolation'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001Based in Richmond, VA, US· patent location history
2005–2020Based in Mechanicsville, VA, US· patent location history
2007–2008Patents assigned to INFINEON TECHNOLOGIES RICHMOND (2)· patent assignee history
2013–2021Patents assigned to NORTHROP GRUMMAN SYSTEMS CORP (13)· patent assignee history
2013–2021Patents assigned to RENNIE MICHAEL (12)· patent assignee history
2015–2019Patents assigned to DI GIACOMO SANDRO J (4)· patent assignee history
2017–2021Patents assigned to KIRBY CHRISTOPHER F (8)· patent assignee history
2018–2021Based in Ashland, VA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NORTHROP GRUMMAN SYSTEMS CORP | 13 | 2013–2021 |
| RENNIE MICHAELself | 12 | 2013–2021 |
| KIRBY CHRISTOPHER F | 8 | 2017–2021 |
| DI GIACOMO SANDRO J | 4 | 2015–2019 |
| INFINEON TECHNOLOGIES RICHMOND | 2 | 2007–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mechanicsville, Virginia, US | 10 | 2005–2020 |
| Ashland, Virginia, US | 6 | 2018–2021 |
| Richmond, Virginia, US | 1 | 2001 |