Inventor
Michael L. Nelson
Inventor
West Redding, CT, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
D21HPulp compositions7%
H04NPictorial communication, e.g. television7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G02BOptical elements, systems or apparatus5%
A01CPlanting2%
A01GHorticulture2%
A23KFodder2%
A23VIndexing scheme relating to foods, foodstuffs or non-alcoholic beverages and lactic or propionic acid bacteria used in foodstuffs or food preparation2%
PatentTitleYear
10,959,384Plant substrate growing medium202110,324,383Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus20199,927,965'Object selection system and method'20189,041,903'Mask inspection with fourier filtering and image compare'20158,736,810'EUV reticle substrates with high thermal conductivity'20147,633,599'Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light'20097,527,816'Feed supplement and method'20097,474,384'Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus'20097,248,336'Method and system for improving focus accuracy in a lithography system'20077,119,883'Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light'20067,053,984'Method and systems for improving focus accuracy in a lithography system'20066,859,260'Method and system for improving focus accuracy in a lithography system'20056,398,373'Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems'20026,199,466'Apparatus and method for processing palletized containers'20015,862,880'Roof scaffolding system'19995,559,601'Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2019Based in West Redding, CT, US· patent location history
2001Based in Lino Lakes, MN, US· patent location history
2002Patents assigned to ASML US INC (1)· patent assignee history
2005–2019Patents assigned to ASML HOLDING NV (9)· patent assignee history
2009–2019Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2009Based in Waconia, MN, US· patent location history
2014–2015Patents assigned to NELSON MICHAEL L (2)· patent assignee history
2015Patents assigned to CATEY ERIC BRIAN (1)· patent assignee history
2018Based in Long Beach, CA, US· patent location history
2021Based in Watsonville, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 9 | 2005–2019 |
| ASML NETHERLANDS BV | 2 | 2009–2019 |
| NELSON MICHAEL Lself | 2 | 2014–2015 |
| ASML US INC | 1 | 2002 |
| CATEY ERIC BRIAN | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| West Redding, CT, US | 11 | 1996–2019 |
| Watsonville, California, US | 1 | 2021 |
| Long Beach, California, US | 1 | 2018 |
| Waconia, Minnesota, US | 1 | 2009 |
| Lino Lakes, Minnesota, US | 1 | 2001 |