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Inventor

Masaya Fujisue

Inventor
Fukuoka, JP

Overview

3→
Patents
1999–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C11Dprimary
C11DDetergent compositions50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,498,132'Method for treating surface of substrate and surface treatment composition used for the same'20026,228,823'Method for treating surface of substrate and surface treatment composition used for the same'20015,885,362'Method for treating surface of substrate'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2002Patents assigned to MITSUBISHI CHEM CORP (3)· patent assignee history
1999Based in Saitama-shi, JP· patent location history
2001Based in Kitakyushu, JP· patent location history
2002Based in Fukuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI CHEM CORP31999–2002
Locations
LocationPatentsSpan
Fukuoka, JP12002
Kitakyushu, JP12001
Saitama-shi, JP11999