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Inventor

Harald E. Verbraak

Inventor
Maastricht, NL

Overview

2→
Patents
2012–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Gprimary
H05GX-ray technique40%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,588,211Radiation source having debris control20208,253,123'Method and device for generating EUV radiation or soft X-rays with enhanced efficiency'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012Patents assigned to JONKERS JEROEN (1)· patent assignee history
2012Patents assigned to KONINKL PHILIPS ELECTRONICS NV (1)· patent assignee history
2012Patents assigned to KUEPPER FELIX A (1)· patent assignee history
2012Patents assigned to NEFF JAKOB W (1)· patent assignee history
2012–2020Based in Maastricht, NL· patent location history
2020Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12020
JONKERS JEROEN12012
KONINKL PHILIPS ELECTRONICS NV12012
KUEPPER FELIX A12012
NEFF JAKOB W12012
Locations
LocationPatentsSpan
Maastricht, NL22012–2020