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Inventor

Won Ho Jhe

Inventor
Seoul, KR

Overview

2→
Patents
2002
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures33%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G11BInformation storage based on relative movement between record carrier and transducer17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
6,476,381'Nano-pattern lithographic fabrication using pulled micro-pipette and method thereof'20026,459,659'Recording medium having planar aperture array and fabrication method thereof, and near-field optical recording/reproducing device using same and method therefor'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002Patents assigned to JHE WON HO (2)· patent assignee history
2002Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JHE WON HOself22002
Locations
LocationPatentsSpan
Seoul, KR22002