Inventor

Shintaro Yamada

Inventor

Shrewsbury, MA, US

Overview

28→

Patents

2002–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds17%

C09DCoating compositions, e.g. paints, varnishes or lacquers14%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

H01LSemiconductor devices9%

C07CAcyclic or carbocyclic compounds5%

C07DHeterocyclic compounds4%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C08LCompositions of macromolecular compounds4%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%

PatentTitleYear

11,042,093Gap-filling method2021 10,886,119Aromatic underlayer2021 10,818,493Silicon-based hardmask2020 10,790,146Aromatic resins for underlayers2020 10,377,848Aromatic resins for underlayers2019 10,186,424Silicon-based hardmask2019 10,114,288Silicon-containing underlayers2018 10,031,420Wet-strippable silicon-containing antireflectant2018 10,007,184Silicon-containing underlayers2018 9,880,469'Resins for underlayers'2018 9,809,672'Aromatic resins for underlayers'2017 9,753,370'Multiple-pattern forming methods'2017 9,601,325'Aromatic resins for underlayers'2017 9,563,126'Hardmask'2017 9,540,476'Aromatic resins for underlayers'2017 9,507,259'Photoresist composition'2016 9,448,486'Photoresist pattern trimming compositions and methods'2016 9,442,377'Wet-strippable silicon-containing antireflectant'2016 9,436,082'Compositions comprising base-reactive component and processes for photolithography'2016 9,334,357'Aromatic resins for underlayers'2016 9,296,879'Hardmask'2016 9,156,785'Base reactive photoacid generators and photoresists comprising same'2015 9,146,470'Photoacid generator and photoresist comprising same'2015 9,136,123'Hardmask surface treatment'2015 9,029,065'Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article'2015 8,900,794'Photoacid generator and photoresist comprising same'2014 7,132,214'Polymers and photoresist compositions for short wavelength imaging'2006 6,399,273'Water-processable photoresist compositions'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2018Based in Marlborough, MA, US· patent location history

2014–2021Patents assigned to ROHM & HAAS ELECT MAT (25)· patent assignee history

2014–2021Based in Shrewsbury, MA, US· patent location history

2015–2016Patents assigned to LI MINGQI (3)· patent assignee history

2015–2016Patents assigned to LIU CONG (3)· patent assignee history

2015–2016Patents assigned to XU CHENG-BAI (3)· patent assignee history

2017–2019Patents assigned to ROHM & HAAS ELECT MATERIALS KOREA LTD (6)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ROHM & HAAS ELECT MAT	25	2014–2021
ROHM & HAAS ELECT MATERIALS KOREA LTD	6	2017–2019
LI MINGQI	3	2015–2016
LIU CONG	3	2015–2016
XU CHENG-BAI	3	2015–2016

Locations

Location	Patents	Span
Shrewsbury, Massachusetts, US	24	2014–2021
Marlborough, Massachusetts, US	4	2002–2018