Inventor
Christian Wolters
Inventor
Campbell, CA, US
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01JElectric discharge tubes or discharge lamps6%
G02BOptical elements, systems or apparatus4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
F21VFunctional features or details of lighting devices or systems thereof3%
G01DMeasuring not specially adapted for a specific variable3%
G01TMeasurement of nuclear or x-radiation3%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding1%
F16CShafts1%
PatentTitleYear
10,324,045Surface defect inspection with large particle monitoring and laser power control201910,241,217System and method for reducing radiation-induced false counts in an inspection system201910,215,712Method and apparatus for producing and measuring dynamically focused, steered, and shaped oblique laser illumination for spinning wafer inspection system201910,088,345Haze and defect distribution and aperture configuration in surface metrology inspectors20189,891,177'TDI sensor in a darkfield system'20189,841,512'System and method for reducing radiation-induced false counts in an inspection system'20179,678,350'Laser with integrated multi line or scanning beam capability'20179,255,891'Inspection beam shaping for improved detection sensitivity'20169,194,812'Illumination energy management in surface inspection'20159,182,358'Multi-spot defect inspection system'20159,116,132'Surface scanning inspection system with independently adjustable scan pitch'20159,068,952'Method and apparatus for producing and measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection system'20158,934,091'Monitoring incident beam position in a wafer inspection system'20158,885,158'Surface scanning inspection system with adjustable scan pitch'20148,817,250'Air bearing for substrate inspection device'20148,786,850'Illumination energy management in surface inspection'20148,755,044'Large particle detection for multi-spot surface scanning inspection systems'20148,582,094'Systems and methods for inspecting specimens including specimens that have a substantially rough uppermost layer'20138,294,887'Fast laser power control with improved reliability for surface inspection'20128,134,698'Dynamic range extension in surface inspection systems'20128,042,254'Method for improving edge handling chuck aerodynamics'20117,787,114'Systems and methods for inspecting a specimen with light at varying power levels'20107,777,875'Systems, circuits and methods for extending the detection range of an inspection system by avoiding detector saturation'20107,773,212'Contemporaneous surface and edge inspection'20107,746,462'Inspection systems and methods for extending the detection range of an inspection system by forcing the photodetector into the non-linear range'20107,697,129'Systems and methods for inspecting a wafer with increased sensitivity'20107,671,982'Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system'20107,607,647'Stabilizing a substrate using a vacuum preload air bearing chuck'20097,605,915'System and method to create haze standard'20097,548,308'Illumination energy management in surface inspection'20097,511,816'Methods and systems for determining drift in a position of a light beam with respect to a chuck'20097,436,508'Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system'20087,423,250'Systems, circuits and methods for extending the detection range of an inspection system by avoiding circuit saturation'20087,414,715'Systems, circuits and methods for extending the detection range of an inspection system by avoiding detector saturation'20087,372,559'Systems and methods for inspecting a wafer with increased sensitivity'20087,304,310'Methods and systems for inspecting a specimen using light scattered in different wavelength ranges'20077,027,146'Methods for forming a calibration standard and calibration standards for inspection systems'20065,858,926'Process for preparing mercury-barium-calcium-copper-oxide-based superconductor materials'1999PP010308'Rosemary plant named `Silver Spires`'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Based in Sutton Green, Guildford, Surry GU4 7QB, GB· patent location history
1999Based in Tallahassee, FL, US· patent location history
2006–2013Patents assigned to KLA TENCOR TECH CORP (14)· patent assignee history
2006–2019Based in Campbell, CA, US· patent location history
2009–2019Patents assigned to KLA TENCOR CORP (23)· patent assignee history
2012–2019Patents assigned to WOLTERS CHRISTIAN (7)· patent assignee history
2012–2019Patents assigned to ROMANOVSKY ANATOLY (4)· patent assignee history
2012–2019Patents assigned to WHITESIDE BRET (3)· patent assignee history
2012–2019Based in San Jose, CA, US· patent location history
2012Based in Cambell, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 23 | 2009–2019 |
| KLA TENCOR TECH CORP | 14 | 2006–2013 |
| WOLTERS CHRISTIANself | 7 | 2012–2019 |
| ROMANOVSKY ANATOLY | 4 | 2012–2019 |
| WHITESIDE BRET | 3 | 2012–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Campbell, California, US | 21 | 2006–2019 |
| San Jose, California, US | 15 | 2012–2019 |
| Cambell, California, US | 1 | 2012 |
| Tallahassee, Florida, US | 1 | 1999 |
| Sutton Green, Guildford, Surry GU4 7QB, GB | 1 | 1998 |