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Inventor

Xinye Liu

Inventor
Sunnyvale, CA, US

Overview

6→
Patents
2000–2013
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
C23FNon-mechanical removal of metallic material from surface17%
C23CCoating metallic material8%
H01LSemiconductor devices8%
PatentTitleYear
8,617,348'Modulating etch selectivity and etch rate of silicon nitride thin films'20138,187,486'Modulating etch selectivity and etch rate of silicon nitride thin films'20128,043,972'Adsorption based material removal process'20117,977,249'Methods for removing silicon nitride and other materials during fabrication of contacts'20117,416,989'Adsorption based material removal process'20086,037,003'Chemical vapor deposition of aluminum oxide'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to HARVARD COLLEGE (1)· patent assignee history
2000Based in Cambridge, MA, US· patent location history
2008–2013Patents assigned to NOVELLUS SYSTEMS INC (5)· patent assignee history
2008–2013Based in Sunnyvale, CA, US· patent location history
2012–2013Patents assigned to LAI CHIUKIN STEVEN (2)· patent assignee history
2012–2013Patents assigned to LIU XINYE (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NOVELLUS SYSTEMS INC52008–2013
LAI CHIUKIN STEVEN22012–2013
LIU XINYEself22012–2013
HARVARD COLLEGE12000
Locations
LocationPatentsSpan
Sunnyvale, California, US52008–2013
Cambridge, Massachusetts, US12000