Inventor
Helmuth Treichel
Inventor
Milpitas, CA, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
B08BCleaning in general8%
C23CCoating metallic material8%
H10DInorganic electric semiconductor devices8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B05DProcesses for applying fluent materials to surfaces, in general4%
B24BMachines, devices, or processes for grinding or polishing4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
PatentTitleYear
10,329,447Polymer based roll coating20196,875,091'Method and apparatus for conditioning a polishing pad with sonic energy'20056,693,043'Method for removing photoresist from low-k films in a downstream plasma system'20046,543,084'Wafer scrubbing brush core'20036,261,407'Method and apparatus for removal of thin films from wafers'20016,240,588'Wafer scrubbing brush core'20016,187,684'Methods for cleaning substrate surfaces after etch operations'20016,057,229'Method for metallizing submicron contact holes in semiconductor bodies'20005,629,053'Method for manufacturing microcrystalline cubic boron-nitride-layers'19975,478,780'Method and apparatus for producing conductive layers or structures for VLSI circuits'19955,399,389'Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates'19954,990,365'Method for producing silicon boronitride layers'19914,755,486'Method of producing a defined arsenic doping in silicon semiconductor substrates'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2000Patents assigned to SIEMENS AG (6)· patent assignee history
1988–2000Based in Augsburg, DE· patent location history
1995Based in South Burlington, VT, US· patent location history
2001–2005Patents assigned to LAM RES CORP (5)· patent assignee history
2001–2019Based in Milpitas, CA, US· patent location history
2004Patents assigned to NOVELLUS SYSTEMS INC (1)· patent assignee history
2019Patents assigned to DIELECTRIC COATING IND (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SIEMENS AG | 6 | 1988–2000 |
| LAM RES CORP | 5 | 2001–2005 |
| DIELECTRIC COATING IND | 1 | 2019 |
| NOVELLUS SYSTEMS INC | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Milpitas, California, US | 7 | 2001–2019 |
| Augsburg, DE | 5 | 1988–2000 |
| South Burlington, VT, US | 1 | 1995 |