LexDanaLexDanabeta
Inventor

Hideshi Miyajima

Inventor
Yokohama, JP

Overview

35→
Patents
1995–2014
Patent span
Electricity
Primary field (CPC H)

Patents· 35 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1038%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
C23CCoating metallic material8%
H10DInorganic electric semiconductor devices4%
H01JElectric discharge tubes or discharge lamps3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B08BCleaning in general1%
B24BMachines, devices, or processes for grinding or polishing1%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium1%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
PatentTitleYear
8,822,342'Method to reduce depth delta between dense and wide features in dual damascene structures'20148,008,190'Method of manufacturing semiconductor device'20117,999,356'Composition for film formation, insulating film, semiconductor device, and process for producing the semiconductor device'20117,855,141'Semiconductor device having multiple wiring layers and method of producing the same'20107,842,518'Method for fabricating semiconductor device'20107,795,142'Method for fabricating a semiconductor device'20107,745,326'Semiconductor device having multiple wiring layers and method of producing the same'20107,589,014'Semiconductor device having multiple wiring layers and method of producing the same'20097,569,498'Manufacturing method of semiconductor device'20097,534,717'Method of manufacturing semiconductor device'20097,462,569'Method of manufacturing semiconductor device'20087,329,601'Method of manufacturing semiconductor device'20087,199,038'Method for fabricating semiconductor device'20077,154,179'Semiconductor device'20067,129,175'Method of manufacturing semiconductor device'20067,094,681'Semiconductor device fabrication method'20066,962,870'Method of manufacturing semiconductor device and semiconductor device'20056,784,092'Method of forming insulating film and method of manufacturing semiconductor device'20046,746,969'Method of manufacturing semiconductor device'20046,737,363'Method of manufacturing semiconductor device'20046,703,302'Method of making a low dielectric insulation layer'20046,614,096'Method for manufacturing a semiconductor device and a semiconductor device'20036,558,747'Method of forming insulating film and process for producing semiconductor device'20036,534,870'Apparatus and method for manufacturing a semiconductor device'20036,458,713'Method for manufacturing semiconductor device'20026,436,849'Method for manufacturing semiconductor device having low dielectric constant insulating film, wafer processing equipment and wafer storing box used in this method'20026,344,420'Plasma processing method and plasma processing apparatus'20026,164,295'CVD apparatus with high throughput and cleaning method therefor'20006,153,509'Method of manufacturing a semiconductor device'20006,051,508'Manufacturing method of semiconductor device'20005,885,352'Vapor phase processing apparatus'19995,851,842'Measurement system and measurement method'19985,731,634'Semiconductor device having a metal film formed in a groove in an insulating film'19985,561,082'Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide'19965,424,246'Method of manufacturing semiconductor metal wiring layer by reduction of metal oxide'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2011Patents assigned to TOSHIBA KK (33)· patent assignee history
1995–1998Based in Tokyo, JP· patent location history
1998–2011Based in Yokohama, JP· patent location history
2005–2010Based in Kanagawa, JP· patent location history
2006–2009Patents assigned to SONY CORP (2)· patent assignee history
2010Based in Somers, NY, US· patent location history
2014Patents assigned to ADVANCED MICRO DEVICES CORP (1)· patent assignee history
2014Patents assigned to ANGYAL MATTHEW (1)· patent assignee history
2014Patents assigned to CHILD CRAIG (1)· patent assignee history
2014Based in Clifton Park, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK331995–2011
SONY CORP22006–2009
ADVANCED MICRO DEVICES CORP12014
ANGYAL MATTHEW12014
CHILD CRAIG12014
Locations
LocationPatentsSpan
Yokohama, JP261998–2011
Kanagawa, JP42005–2010
Tokyo, JP31995–1998
Clifton Park, New York, US12014
Somers, New York, US12010