Inventor
Christopher Neville
Inventor
Portland, OR, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1022%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
7,858,979'Method of aligning deposited nanotubes onto an etched feature using a spacer'20107,541,216'Method of aligning deposited nanotubes onto an etched feature using a spacer'20097,313,508'Process window compliant corrections of design layout'20077,001,695'Multiple alternating phase shift technology for amplifying resolution'20066,426,131'Off-axis pupil aperture and method for making the same'20025,898,478'Method of using a test reticle to optimize alignment of integrated circuit process layers'19995,627,624'Integrated circuit test reticle and alignment mark optimization method'19975,329,334'Integrated circuit test reticle and alignment mark optimization method'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2006Patents assigned to LSI LOGIC CORP (5)· patent assignee history
1994–2002Based in Sunnyvale, CA, US· patent location history
2006–2010Based in Portland, OR, US· patent location history
2007Patents assigned to LSI CORP (1)· patent assignee history
2009–2010Patents assigned to NANTERO INC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LSI LOGIC CORP | 5 | 1994–2006 |
| NANTERO INC | 2 | 2009–2010 |
| LSI CORP | 1 | 2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 4 | 2006–2010 |
| Sunnyvale, California, US | 4 | 1994–2002 |