Inventor
Patricio E. Romero
Inventor
Portland, OR, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1019%
C23CCoating metallic material14%
H10DInorganic electric semiconductor devices14%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
H10BElectronic memory devices2%
H10NElectric solid-state devices not otherwise provided for2%
PatentTitleYear
10,971,600Selective gate spacers for semiconductor devices202110,756,215Selective deposition utilizing sacrificial blocking layers for semiconductor devices202010,464,959Inherently selective precursors for deposition of second or third row transition metal thin films201910,396,176Selective gate spacers for semiconductor devices201910,243,080Selective deposition utilizing sacrificial blocking layers for semiconductor devices201910,217,646Transition metal dry etch by atomic layer removal of oxide layers for device fabrication20199,932,671Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD)20189,786,559'Process and material for preventing deleterious expansion of high aspect ratio copper filled through silicon vias (TSVs)'20179,583,389'Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD)'20179,530,733'Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regions'20169,455,150'Conformal thin film deposition of electropositive metal alloy films'20169,390,932'Electropositive metal containing layers for semiconductor applications'20169,385,033'Method of forming a metal from a cobalt metal precursor'20169,236,292'Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD)'20169,090,964'Additives to improve the performance of a precursor source for cobalt deposition'20159,067,958'Scalable and high yield synthesis of transition metal bis-diazabutadienes'20158,952,355'Electropositive metal containing layers for semiconductor applications'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2021Patents assigned to INTEL CORP (17)· patent assignee history
2015–2017Patents assigned to CLENDENNING SCOTT B (4)· patent assignee history
2015–2017Patents assigned to ROMERO PATRICIO E (4)· patent assignee history
2015–2021Based in Portland, OR, US· patent location history
2016–2017Patents assigned to GSTREIN FLORIAN (2)· patent assignee history
2016–2017Patents assigned to ROBERTS JEANETTE M (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INTEL CORP | 17 | 2015–2021 |
| CLENDENNING SCOTT B | 4 | 2015–2017 |
| ROMERO PATRICIO Eself | 4 | 2015–2017 |
| GSTREIN FLORIAN | 2 | 2016–2017 |
| ROBERTS JEANETTE M | 2 | 2016–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 17 | 2015–2021 |