Inventor
Ren-Yih Zeng
Inventor
Hsinchu, TW
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
PatentTitleYear
5,614,420'Method of preventing mask tone error'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Patents assigned to TAIWAN SEMICONDOCTOR MANUFACTU (1)· patent assignee history
1997Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDOCTOR MANUFACTU | 1 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 1 | 1997 |