Inventor

Bernardo Kastrup

Inventor
Veldhoven, NL

Overview

8→
Patents
2012–2021
Patent span
Physics
Primary field (CPC G)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G06FElectric digital data processing16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
G06NComputing arrangements based on specific computational models13%
H01LSemiconductor devices13%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C04BLime, magnesia3%
F16KValves3%
G02BOptical elements, systems or apparatus3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2021Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2012–2016Patents assigned to KASTRUP BERNARDO (2)· patent assignee history
2012Patents assigned to ALBRIGHT RONALD P (1)· patent assignee history
2012Patents assigned to ASML HOLDING NV (1)· patent assignee history
2012Patents assigned to CEBUHAR WENCESLAO A (1)· patent assignee history
2012–2016Based in Eindhoven, NL· patent location history
2016–2021Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV82012–2021
KASTRUP BERNARDOself22012–2016
ALBRIGHT RONALD P12012
ASML HOLDING NV12012
CEBUHAR WENCESLAO A12012
Locations
LocationPatentsSpan
Veldhoven, NL62016–2021
Eindhoven, NL22012–2016