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Inventor

Shinichi Hamaguchi

Inventor
Tokyo, JP

Overview

43→
Patents
1994–2020
Patent span
Physics
Primary field (CPC G)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography23%
H01JElectric discharge tubes or discharge lamps11%
B82YSpecific uses or applications of nanostructures6%
G02BOptical elements, systems or apparatus6%
G11BInformation storage based on relative movement between record carrier and transducer6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
A61KPreparations for medical, dental or toiletry purposes4%
A61LMethods or apparatus for sterilising materials or objects in general4%
A61QSpecific use of cosmetics or similar toiletry preparations4%
PatentTitleYear
10,656,568Intermediate transfer member and image forming apparatus202010,274,874Intermediate transfer member, method for producing intermediate transfer member, and image forming apparatus201910,241,446Intermediate transfer member and image forming apparatus201910,133,216Intermediate transfer member and image forming apparatus having the same201810,042,291Intermediate transfer member, image forming apparatus and image forming method20189,799,489'Exposure apparatus'20179,750,847'Chitosan hydrogel derivatives as a coating agent with broad spectrum of antimicrobial activities'20179,511,335'Manufacturing method of organic-inorganic composite material and optical material'20169,478,396'Charged particle beam exposure apparatus'20169,400,457'Intermediate transfer element and image formation apparatus including the same'20169,213,240'Electron beam exposure method'20159,199,000'Chitosan hydrogel derivatives as a coating agent with broad spectrum of antimicrobial activities'20159,201,320'Production process of organic photoreceptor'20159,116,434'Electron beam exposure method'20159,063,448'Electrophotographic photoconductor and image forming apparatus'20159,038,839'Box with component internally housed'20158,808,954'Electrophotographic photoconductor, process cartridge including the same, and image forming apparatus including the same'20148,709,470'Chitosan hydrogel derivatives as a coating agent with broad spectrum of antimicrobial activities'20148,652,714'Electrophotographic photoconductor, process cartridge including the same, and image forming apparatus including the same'20148,450,034'Electrophotographic photoreceptor, image forming method and image forming apparatus'20138,441,274'Wafer unit manufacturing method for testing a semiconductor chip wafer'20138,289,040'Test wafer unit and test system'20128,158,314'Organic photoreceptor and image forming apparatus'20128,129,617'Electric distribution box'20128,129,083'Electrophotographic photoreceptor and image forming apparatus'20128,071,877'Box for accommodating electric connection box'20118,034,519'Electrophotographic photoreceptor and image formation method'20118,009,527'Optical pickup device'20117,969,834'Optical pickup device having a structure providing efficient light usage'20117,560,209'Electrophotographic image forming apparatus and image forming unit'20097,470,886'Light receiving circuit, semiconductor laser device, and optical pickup device'20087,313,061'Optical pickup having a plurality of photodetectors divided into four regions used to obtain both focus and tracking error signals'20077,247,826'Optical pickup apparatus'20077,057,146'Optical pickup having a diffraction grating and a hologram element'20067,041,988'Electron beam exposure apparatus and electron beam processing apparatus'20066,878,496'Electrophotoreceptor, image forming method, image forming apparatus and processing cartridge'20056,787,780'Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device'20046,764,925'Semiconductor device manufacturing system and electron beam exposure apparatus'20046,703,624'Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device'20046,620,567'Electrophotographic photoreceptor, image forming apparatus and processing cartridge'20036,472,113'Electrophotoreceptor, image forming apparatus and processing cartridge'20026,040,105'Electrophotographic photoreceptor, and a production method of the same'20005,337,247'Exposure data forming method, pattern forming method, pattern exposure method and pattern exposure apparatus'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2005Patents assigned to KONISHIROKU PHOTO IND (4)· patent assignee history
2000–2020Based in Hino, JP· patent location history
2004–2017Patents assigned to ADVANTEST CORP (9)· patent assignee history
2004–2019Based in Tokyo, JP· patent location history
2006–2011Based in Hyogo, JP· patent location history
2009–2014Patents assigned to KONICA MINOLTA BUSINESS TECH (7)· patent assignee history
2011–2015Patents assigned to HAMAGUCHI SHINICHI (11)· patent assignee history
2011–2015Based in Kakegawa, JP· patent location history
2014–2017Based in Aichi, JP· patent location history
2015–2020Patents assigned to KONICA MINOLTA INC (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HAMAGUCHI SHINICHIself112011–2015
ADVANTEST CORP92004–2017
KONICA MINOLTA INC92015–2020
KONICA MINOLTA BUSINESS TECH72009–2014
KONISHIROKU PHOTO IND42000–2005
Locations
LocationPatentsSpan
Tokyo, JP192004–2019
Hino, JP92000–2020
Hyogo, JP52006–2011
Aichi, JP32014–2017
Kakegawa, JP32011–2015