Inventor
KAUSTUVE BHATTACHARYYA
Inventor
NL
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
G01BMeasuring length, thickness or similar linear dimensions12%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G06TImage data processing or generation, in general6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G06FElectric digital data processing4%
H01LSemiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
12,429,328Metrology method, target and substrate202512,276,921Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method202512,204,826Method and apparatus for inspection and metrology202512,189,314Metrology method and associated metrology and lithographic apparatuses202512,189,305Metrology method and apparatus and computer program202512,158,435Illumination and detection apparatus for a metrology apparatus202412,130,246Method for overlay metrology and apparatus thereof202412,061,421Method and system for determining information about a target structure202412,032,299Metrology method and associated metrology and lithographic apparatuses202412,032,297Method for monitoring lithographic apparatus202412,013,647Metrology method202411,886,125Method for inferring a local uniformity metric202411,703,772Recipe selection based on inter-recipe consistency202311,640,116Metrology method, computer product and system202311,580,274Method and apparatus for inspection and metrology202311,466,980Metrology method and apparatus, lithographic system, device manufacturing method and substrate202211,428,521Metrology method, target and substrate202211,422,476Methods and apparatus for monitoring a lithographic manufacturing process202211,385,552Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method202211,385,553Metrology method, patterning device, apparatus and computer program202211,300,883Method to determine a patterning process parameter202211,249,404System and method for measurement of alignment202211,204,239Metrology method, target and substrate2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (23)· patent assignee history
2021–2025Based in NL· patent location history
2024Patents assigned to ASML HOLDING NV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 23 | 2021–2025 |
| ASML HOLDING NV | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 23 | 2021–2025 |