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Inventor

Noriyuki Sakudo

Inventor
Ome, JP

Overview

20→
Patents
1977–2009
Patent span
Electricity
Primary field (CPC H)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps57%
H05HPlasma technique13%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
B23KSoldering or unsoldering3%
C07DHeterocyclic compounds3%
H01PWaveguides3%
H10DInorganic electric semiconductor devices3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
7,557,364'Charge neutralizing device'20097,166,965'Waveguide and microwave ion source equipped with the waveguide'20075,506,472'Variable-frequency type radio-frequency quadrupole accelerator including quadrupole cooling means'19965,349,196'Ion implanting apparatus'19945,266,146'Microwave-powered plasma-generating apparatus and method'19935,086,256'External resonance circuit type radio frequency quadrupole accelerator'19925,053,678'Microwave ion source'19914,924,101'Charged particle source'19904,801,847'Charged particle accelerator using quadrupole electrodes'19894,658,143'Ion source'19874,633,138'Ion implanter'19864,629,930'Plasma ion source'19864,577,396'Method of forming electrical contact to a semiconductor substrate via a metallic silicide or silicon alloy layer formed in the substrate'19864,543,465'Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase'19854,433,228'Microwave plasma source'19844,409,520'Microwave discharge ion source'19834,393,333'Microwave plasma ion source'19834,316,090'Microwave plasma ion source'19824,101,411'Plasma etching apparatus'19784,058,748'Microwave discharge ion source'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1996Patents assigned to HITACHI LTD (17)· patent assignee history
1977–1991Based in Ome, JP· patent location history
1978–1986Based in Ohme, JP· patent location history
1992Patents assigned to AGENCY IND SCIENCE TECHN (1)· patent assignee history
1992–1996Based in Hitachi, JP· patent location history
2007Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2007Based in Kanazawa, JP· patent location history
2009Patents assigned to PANASONIC CORP (1)· patent assignee history
2009Based in Ishikawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD171977–1996
AGENCY IND SCIENCE TECHN11992
APPLIED MATERIALS INC12007
PANASONIC CORP12009
Locations
LocationPatentsSpan
Ome, JP71977–1991
Ohme, JP71978–1986
Hitachi, JP41992–1996
Ishikawa, JP12009
Kanazawa, JP12007