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Inventor

Hung-Ling Shih

Inventor
Tainan, TW

Overview

21→
Patents
2012–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices27%
H01LSemiconductor devices26%
H10BElectronic memory devices16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
G11CStatic stores1%
H10NElectric solid-state devices not otherwise provided for1%
PatentTitleYear
10,879,250Semiconductor structure for memory device and method for forming the same202010,861,553Device-region layout for embedded flash202010,680,002Method to reduce kink effect in semiconductor devices202010,541,245Semiconductor device and manufacturing method thereof202010,510,544Non-volatile memory semiconductor device and manufacturing method thereof201910,269,818Semiconductor device and manufacturing method thereof201910,269,815Semiconductor device and manufacturing method thereof201910,204,822Method for forming trench liner passivation201910,084,056Semiconductor structure and method of manufacturing the same20189,997,524Semiconductor memory device and manufacturing method thereof20189,929,167'Semiconductor device and manufacturing method thereof'20189,917,003'Trench liner passivation for dark current improvement'20189,384,962'Oxygen treatment of replacement work-function metals in CMOS transistor gates'20169,287,280'Method to improve memory cell erasure'20169,252,150'High endurance non-volatile memory cell'20168,999,830'Semiconductor device having metal gate and manufacturing method thereof'20158,952,451'Semiconductor device having metal gate and manufacturing method thereof'20158,802,524'Method of manufacturing semiconductor device having metal gates'20148,728,949'Method for fabricating a semiconductor device'20148,704,294'Semiconductor device having metal gate and manufacturing method thereof'20148,232,152'Removing method of a hard mask'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2016Patents assigned to UNITED MICROELECTRONICS CORP (7)· patent assignee history
2012–2016Patents assigned to SHIH HUNG-LING (5)· patent assignee history
2012–2016Patents assigned to HSU SHAO-HUA (4)· patent assignee history
2012–2016Patents assigned to CHEN CHENG-GUO (3)· patent assignee history
2012–2016Based in Chiayi County, TW· patent location history
2014Based in Pingtung County, TW· patent location history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (14)· patent assignee history
2016–2020Based in Tainan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD142016–2020
UNITED MICROELECTRONICS CORP72012–2016
SHIH HUNG-LINGself52012–2016
HSU SHAO-HUA42012–2016
CHEN CHENG-GUO32012–2016
Locations
LocationPatentsSpan
Tainan, TW142016–2020
Chiayi County, TW62012–2016
Pingtung County, TW12014