Inventor
Jean-Yves Robic
Inventor
Grenoble, FR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures22%
G02BOptical elements, systems or apparatus22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G21KHandling of particles or ionising radiation not otherwise provided for11%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
7,745,070'Structure of a lithography mask'20106,593,036'Structure for a reflection lithography mask and method for making same'20036,047,012'Microlaser with modulated emission frequency'20005,879,820'Multilayer stack of fluoride materials usable in optics and its production process'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2010Patents assigned to COMMISSARIAT ENERGIE ATOMIQUE (4)· patent assignee history
1999Patents assigned to FRANCE ETAT (1)· patent assignee history
1999–2010Based in Grenoble, FR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| COMMISSARIAT ENERGIE ATOMIQUE | 4 | 1999–2010 |
| FRANCE ETAT | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Grenoble, FR | 4 | 1999–2010 |