Inventor

Fabrizio Evangelista

Inventor
Eindhoven, NL

Overview

10→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2013–2017Patents assigned to EVANGELISTA FABRIZIO (6)· patent assignee history
2013–2017Patents assigned to RIEPEN MICHEL (6)· patent assignee history
2013–2017Patents assigned to CORTIE ROGIER HENDRIKUS MAGDALENA (4)· patent assignee history
2013–2016Patents assigned to KEMPER NICOLAAS RUDOLF (3)· patent assignee history
2013–2020Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102013–2020
EVANGELISTA FABRIZIOself62013–2017
RIEPEN MICHEL62013–2017
CORTIE ROGIER HENDRIKUS MAGDALENA42013–2017
KEMPER NICOLAAS RUDOLF32013–2016
Locations
LocationPatentsSpan
Eindhoven, NL102013–2020