Inventor
Kai-Chun Lin
Inventor
Hsinchu, TW
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
A41Bprimary
A41BShirts11%
A41DOuterwear11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
G06FElectric digital data processing11%
H01LSemiconductor devices11%
H04NPictorial communication, e.g. television11%
H10DInorganic electric semiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
11,016,398Integrated circuit overlay test patterns and method thereof202110,939,102Post processing apparatus with super-resolution filter and loop restoration filter in block-level pipeline and associated post processing method20219,717,289'Garments having targeted compressive areas and methods of manufacturing the same'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017Patents assigned to SPANX INC (1)· patent assignee history
2017Based in Long Beach, CA, US· patent location history
2021Patents assigned to MEDIATEK INC (1)· patent assignee history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MEDIATEK INC | 1 | 2021 |
| SPANX INC | 1 | 2017 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 2 | 2021 |
| Long Beach, California, US | 1 | 2017 |