Inventor
Yusuke Horiguchi
Inventor
Toyama, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
H01LSemiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%
C08LCompositions of macromolecular compounds6%
C09JAdhesives6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
PatentTitleYear
10,242,923Formulations containing mixed resin systems and the use thereof for wafer-level underfill for 3D TSV packages20199,771,500'Sealant composition for electronic device'20179,576,871'Composition for electronic device'20179,436,085'Composition for forming photosensitive resist underlayer film'20169,334,429'Underfill sealant composition'20168,481,247'Resist underlayer film forming composition containing liquid additive'20138,227,172'Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing'20128,048,615'Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2016Patents assigned to NISSAN CHEMICAL IND LTD (4)· patent assignee history
2011–2016Based in Toyama, JP· patent location history
2012–2016Patents assigned to HORIGUCHI YUSUKE (3)· patent assignee history
2012–2013Patents assigned to SHINJO TETSUYA (2)· patent assignee history
2012–2013Patents assigned to TAKEI SATOSHI (2)· patent assignee history
2016–2019Patents assigned to HENKEL AG & CO KGAA (4)· patent assignee history
2016–2017Based in Yokohama, JP· patent location history
2019Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HENKEL AG & CO KGAA | 4 | 2016–2019 |
| NISSAN CHEMICAL IND LTD | 4 | 2011–2016 |
| HORIGUCHI YUSUKEself | 3 | 2012–2016 |
| SHINJO TETSUYA | 2 | 2012–2013 |
| TAKEI SATOSHI | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 4 | 2011–2016 |
| Yokohama, JP | 3 | 2016–2017 |
| Kanagawa, JP | 1 | 2019 |