Inventor

Baw-Ching Perng

Inventor
Hsinchu, TW

Overview

31→
Patents
2002–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H10DInorganic electric semiconductor devices28%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
H01LSemiconductor devices5%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C11DDetergent compositions2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
9,673,093'Semiconductor device and method of making wafer level chip scale package'20179,093,450'Chip package and manufacturing method thereof'20158,916,420'Chip package and manufacturing method thereof'20148,766,431'Power MOSFET package'20148,610,271'Chip package and manufacturing method thereof'20138,564,133'Chip package and method for forming the same'20138,410,599'Power MOSFET package'20138,053,894'Surface treatment of metal interconnect lines'20117,400,401'Measuring low dielectric constant film properties during processing'20087,378,308'CMOS devices with improved gap-filling'20087,354,847'Method of trimming technology'20087,271,103'Surface treated low-k dielectric as diffusion barrier for copper metallization'20077,230,270'Self-aligned double gate device and method for forming same'20077,208,331'Methods and structures for critical dimension and profile measurement'20077,176,137'Method for multiple spacer width control'20077,172,933'Recessed polysilicon gate structure for a strained silicon MOSFET device'20077,148,114'Process for patterning high-k dielectric material'20067,122,484'Process for removing organic materials during formation of a metal interconnect'20067,115,526'Method for wet etching of high k thin film at low temperature'20067,081,413'Method and structure for ultra narrow gate'20067,037,849'Process for patterning high-k dielectric material'20067,012,027'Zirconium oxide and hafnium oxide etching using halogen containing chemicals'20067,011,929'Method for forming multiple spacer widths'20066,969,688'Wet etchant composition and method for etching HfO2 and ZrO2'20056,955,984'Surface treatment of metal interconnect lines'20056,943,077'Selective spacer layer deposition method for forming spacers with different widths'20056,838,381'Methods for improving sheet resistance of silicide layer after removal of etch stop layer'20056,812,044'Advanced control for plasma process'20046,746,900'Method for forming a semiconductor device having high-K gate dielectric material'20046,498,067'Integrated approach for controlling top dielectric loss during spacer etching'20026,479,403'Method to pattern polysilicon gates with high-k material gate dielectric'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2011Patents assigned to TAIWAN SEMICONDUCTOR MFG (22)· patent assignee history
2002–2011Based in Hsinchu, TW· patent location history
2013Patents assigned to CHANG SHU-MING (3)· patent assignee history
2013Patents assigned to PERNG BAW-CHING (3)· patent assignee history
2013Patents assigned to WEN YING-NAN (3)· patent assignee history
2013Based in Hsinchu County, TW· patent location history
2014–2015Patents assigned to XINTEC INC (3)· patent assignee history
2014–2017Based in Baoshan Township, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG222002–2011
CHANG SHU-MING32013
PERNG BAW-CHINGself32013
WEN YING-NAN32013
XINTEC INC32014–2015
Locations
LocationPatentsSpan
Hsinchu, TW242002–2011
Baoshan Township, TW42014–2017
Hsinchu County, TW32013