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Inventor

Hong-Xing Wang

Inventor
Osaka, JP

Overview

6→
Patents
2003–2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C01Bprimary
C01BNon-metallic elements23%
C23CCoating metallic material15%
C30BSingle-crystal growth15%
H01JElectric discharge tubes or discharge lamps15%
B82YSpecific uses or applications of nanostructures8%
H03FAmplifiers8%
H04RLoudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
9,357,290'Speaker system and method for driving same'20168,518,542'Carbon film and carbon film structure'20138,421,330'Carbon film having shape suitable for field emission'20137,839,067'Carbon film having shape suitable for field emission'20106,666,921'Chemical vapor deposition apparatus and chemical vapor deposition method'20036,592,674'Chemical vapor deposition apparatus and chemical vapor deposition method'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to JAPAN PIONICS (2)· patent assignee history
2003Patents assigned to TOKUSHIMA SANSO CO LTD (2)· patent assignee history
2003Based in Tokushima, JP· patent location history
2010–2013Patents assigned to PURERON JAPAN CO LTD (2)· patent assignee history
2010–2013Based in Osaka, JP· patent location history
2013Patents assigned to HABA MASANORI (2)· patent assignee history
2013Patents assigned to HIRAKI AKIO (2)· patent assignee history
2016Based in Shenzhen, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HABA MASANORI22013
HIRAKI AKIO22013
JAPAN PIONICS22003
PURERON JAPAN CO LTD22010–2013
TOKUSHIMA SANSO CO LTD22003
Locations
LocationPatentsSpan
Osaka, JP32010–2013
Tokushima, JP22003
Shenzhen, CN12016