Inventor
Hung-Sui Lin
Inventor
Hsin-Ying, TW
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices45%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10BElectronic memory devices12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G11CStatic stores6%
H01LSemiconductor devices6%
H02HEmergency protective circuit arrangements3%
PatentTitleYear
9,520,353'Metal-insulation-metal device'20169,059,192'Metal-insulation-metal device'20158,045,306'Electrical-overstress protection circuit for an integrated circuit'20116,812,099'Method for fabricating non-volatile memory having P-type floating gate'20046,808,995'Semiconductor device with minimal short-channel effects and low bit-line resistance'20046,720,614'Operation method for programming and erasing a data in a P-channel sonos memory cell'20046,671,209'Erasing method for p-channel NROM'20036,635,946'Semiconductor device with trench isolation structure'20036,620,693'Non-volatile memory and fabrication thereof'20036,555,844'Semiconductor device with minimal short-channel effects and low bit-line resistance'20036,524,919'Method for manufacturing a metal oxide semiconductor with a sharp corner spacer'20036,524,913'Method of fabricating a non-volatile memory with a spacer'20036,514,807'Method for fabricating semiconductor device applied system on chip'20036,498,377'SONOS component having high dielectric property'20026,492,235'Method for forming extension by using double etch spacer'20026,482,709'Manufacturing process of a MOS transistor'20026,458,643'Method of fabricating a MOS device with an ultra-shallow junction'20026,455,388'Method of manufacturing metal-oxide semiconductor transistor'20026,448,142'Method for fabricating a metal oxide semiconductor transistor'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2004Patents assigned to MACRONIX INT CO LTD (16)· patent assignee history
2002–2004Based in Hsin-Ying, TW· patent location history
2002–2016Based in Tainan, TW· patent location history
2011–2016Patents assigned to HIMAX TECH LTD (3)· patent assignee history
2015Patents assigned to LIN HUNG-SUI (1)· patent assignee history
2015Patents assigned to LIN MAO-HSIUNG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MACRONIX INT CO LTD | 16 | 2002–2004 |
| HIMAX TECH LTD | 3 | 2011–2016 |
| LIN HUNG-SUIself | 1 | 2015 |
| LIN MAO-HSIUNG | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsin-Ying, TW | 11 | 2002–2004 |
| Tainan, TW | 8 | 2002–2016 |