LexDanaLexDanabeta
Inventor

Naoki Nishida

Inventor
Kusatsu, JP

Overview

21→
Patents
1998–2013
Patent span
Physics
Primary field (CPC G)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G11BInformation storage based on relative movement between record carrier and transducer17%
B82YSpecific uses or applications of nanostructures10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
B41JTypewriters3%
G01QScanning-probe techniques or apparatus3%
H10DInorganic electric semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
8,609,304'Method of manufacturing a transfer mask and method of manufacturing a semiconductor device'20138,298,903'Monitor pattern of semiconductor device and method of manufacturing semiconductor device'20128,134,893'Optical recording head and optical recording apparatus'20128,116,174'Near field light generating device, optically assisted magnetic recording head, optically assisted magnetic recording device, near field optical microscope and near field light exposure apparatus'20127,944,800'Optical recording head, optical recording head manufacturing method and recording/reproducing device'20117,883,982'Monitor pattern of semiconductor device and method of manufacturing semiconductor device'20117,852,713'Thermal-assisted magnetic recording head and magnetic recording apparatus'20107,755,978'Recording head and recorder'20107,611,808'Halftone type phase shift mask blank and halftone type phase shift mask'20097,419,914'Semiconductor device fabrication method'20087,227,689'Birefringence optical element and manufacturing method thereof'20077,166,392'Halftone type phase shift mask blank and halftone type phase shift mask'20077,016,561'Optical switch device having movable switching member'20066,992,327'Monitor pattern of semiconductor device and method of manufacturing semiconductor device'20066,807,330'Optical switch using an optical waveguide'20046,671,446'Optical waveguide and method of manufacturing same'20036,654,535'Polyimide optical waveguide'20036,587,629'Optical waveguide channel device'20036,044,850'Semiconductor device manufacturing method including ashing process'20005,852,702'Thin film optical waveguide and optical deflecting device'19985,835,643'Waveguide input/output device'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2006Patents assigned to MINOLTA CO LTD (7)· patent assignee history
1998Based in Osaka, JP· patent location history
2000–2008Patents assigned to FUJITSU LTD (3)· patent assignee history
2003–2012Based in Kusatsu, JP· patent location history
2006–2012Based in Kasugai, JP· patent location history
2007–2013Patents assigned to HOYA CORP (3)· patent assignee history
2007–2013Based in Tokyo, JP· patent location history
2008–2011Based in Kawasaki, JP· patent location history
2010–2012Patents assigned to KONICA MINOLTA OPTO INC (4)· patent assignee history
2012–2013Patents assigned to NISHIDA NAOKI (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MINOLTA CO LTD71998–2006
KONICA MINOLTA OPTO INC42010–2012
NISHIDA NAOKIself42012–2013
FUJITSU LTD32000–2008
HOYA CORP32007–2013
Locations
LocationPatentsSpan
Kusatsu, JP112003–2012
Tokyo, JP32007–2013
Kasugai, JP22006–2012
Kawasaki, JP22008–2011
Osaka, JP21998