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Inventor

Helen R. Armer

Inventor
Cupertino, CA, US

Overview

17→
Patents
2004–2016
Patent span
Physics
Primary field (CPC G)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G05BControl or regulating systems in general12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
Y02PClimate change mitigation technologies in the production or processing of goods11%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
G03DApparatus for processing exposed photographic materials10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
Y10TTechnical subjects covered by former us classification10%
H01JElectric discharge tubes or discharge lamps2%
B24BMachines, devices, or processes for grinding or polishing1%
PatentTitleYear
9,275,334'Increasing signal to noise ratio for creation of generalized and robust prediction models'20168,550,031'Cluster tool architecture for processing a substrate'20138,215,262'Cluster tool architecture for processing a substrate'20128,181,596'Cluster tool architecture for processing a substrate'20128,146,530'Cluster tool architecture for processing a substrate'20128,019,467'Scheduling method for processing equipment'20117,925,377'Cluster tool architecture for processing a substrate'20117,819,079'Cartesian cluster tool configuration for lithography type processes'20107,743,728'Cluster tool architecture for processing a substrate'20107,694,647'Cluster tool architecture for processing a substrate'20107,522,968'Scheduling method for processing equipment'20097,501,354'Formation of low K material utilizing process having readily cleaned by-products'20097,357,842'Cluster tool architecture for processing a substrate'20087,082,345'Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities'20067,049,606'Electron beam treatment apparatus'20067,018,941'Post treatment of low k dielectric films'20066,831,284'Large area source for uniform electron beam generation'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2016Patents assigned to APPLIED MATERIALS INC (16)· patent assignee history
2004–2013Based in Cupertino, CA, US· patent location history
2012–2013Patents assigned to ARMER HELEN R (4)· patent assignee history
2012–2013Patents assigned to BACKER JOHN A (4)· patent assignee history
2012–2013Patents assigned to CARLSON CHARLES (4)· patent assignee history
2012–2013Patents assigned to HERCHEN HARALD (4)· patent assignee history
2016Based in Los Altos, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC162004–2016
ARMER HELEN Rself42012–2013
BACKER JOHN A42012–2013
CARLSON CHARLES42012–2013
HERCHEN HARALD42012–2013
Locations
LocationPatentsSpan
Cupertino, California, US162004–2013
Los Altos, California, US12016