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Inventor

Shirushi Yamamoto

Inventor
Shizuoka, JP

Overview

4→
Patents
1986–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
6,616,770'Cleaning method of containers and apparatus thereof'20036,347,637'Cleaning method of containers and apparatus thereof'20024,797,348'Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure'19894,610,953'Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986–1989Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
1986–1989Based in Isehara, JP· patent location history
2002Patents assigned to CLARIANT INT LTD (1)· patent assignee history
2002–2003Based in Shizuoka, JP· patent location history
2003Patents assigned to CLARIANT FINANCE BVI LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD21986–1989
CLARIANT FINANCE BVI LTD12003
CLARIANT INT LTD12002
Locations
LocationPatentsSpan
Shizuoka, JP22002–2003
Isehara, JP21986–1989