Inventor
Daniel Jason Riggs
Inventor
San Diego, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique42%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light27%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
PatentTitleYear
10,674,591Target expansion rate control in an extreme ultraviolet light source202010,314,153Target expansion rate control in an extreme ultraviolet light source20199,980,359Systems and methods for controlling EUV energy generation using pulse intensity20189,832,854Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation20179,820,368'Target expansion rate control in an extreme ultraviolet light source'20179,755,396'EUV LPP source with improved dose control by combining pulse modulation and pulse control mode'20179,713,240'Stabilizing EUV light power in an extreme ultraviolet light source'20179,536,631'Systems and methods to avoid instability conditions in a source plasma chamber'20179,426,872'System and method for controlling source laser firing in an LPP EUV light source'20169,240,664'System and method for extending gas life in a two chamber gas discharge laser system'20169,000,403'System and method for adjusting seed laser pulse width to control EUV output energy'20158,873,600'System and method for high accuracy gas refill in a two chamber gas discharge laser system'20148,767,791'System and method for controlling gas concentration in a two-chamber gas discharge laser system'20148,681,832'System and method for high accuracy gas inject in a two chamber gas discharge laser system'20148,598,552'System and method to optimize extreme ultraviolet light generation'20138,411,720'System and method for automatic gas optimization in a two-chamber gas discharge laser system'20138,254,420'Advanced laser wavelength control'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2015Patents assigned to CYMER INC (5)· patent assignee history
2012–2016Patents assigned to RIGGS DANIEL J (5)· patent assignee history
2012–2020Based in San Diego, CA, US· patent location history
2013–2014Patents assigned to JIANG RUI (2)· patent assignee history
2014–2016Patents assigned to Cymer LLC (3)· patent assignee history
2015–2020Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 10 | 2015–2020 |
| CYMER INC | 5 | 2012–2015 |
| RIGGS DANIEL Jself | 5 | 2012–2016 |
| Cymer LLC | 3 | 2014–2016 |
| JIANG RUI | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 17 | 2012–2020 |