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Inventor

Michael Heissmeier

Inventor
Mnchen, DE

Overview

3→
Patents
2003–2004
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
6,730,463'Method for determining and removing phase conflicts on alternating phase masks'20046,680,151'Alternating phase mask'20046,660,437'Alternating phase mask'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2004Patents assigned to INFINEON TECHNOLOGIES AG (3)· patent assignee history
2003–2004Based in Mnchen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG32003–2004
Locations
LocationPatentsSpan
Mnchen, DE32003–2004