Inventor
Takahiro Horikoshi
Inventor
Saitama, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients20%
C08LCompositions of macromolecular compounds17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
B29CShaping or joining of plastics6%
C08JWorking-up6%
G06FElectric digital data processing6%
H01LSemiconductor devices6%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers3%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
PatentTitleYear
11,130,851Particulate nucleating agent, resin composition, molded product, and production method thereof20219,299,620'Substrate bonding apparatus and substrate bonding method'20169,249,267'Resin-additive masterbatch'20168,980,163'Process for producing plastic bottle'20158,856,722'System for semiconductor device, method for manufacturing semiconductor device, semiconductor device and method for bonding substrates'20148,546,473'Polyolefin resin composition'20138,454,771'Substrate bonding apparatus and substrate bonding method'20138,370,789'System for semiconductor device, method for manufacturing semiconductor device, semiconductor device and method for bonding substrates'20138,058,334'Polyester resin composition'20118,017,678'Polyester resin composition'20117,662,893'Method for producing stabilized polymer'20107,132,499'Polyester resin container with improved weatherability'20066,813,004'Exposure method, exposure apparatus and making method of the apparatus, and device and manufacturing method of the device'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2016Patents assigned to NIKON CORP (5)· patent assignee history
2004–2014Based in Chofu, JP· patent location history
2006Patents assigned to ASAHI DENKA CO LTD (1)· patent assignee history
2006–2021Based in Saitama, JP· patent location history
2010–2021Patents assigned to ADEKA CORP (7)· patent assignee history
2011–2016Patents assigned to HORIKOSHI TAKAHIRO (6)· patent assignee history
2011–2013Patents assigned to KAWAMOTO NAOSHI (2)· patent assignee history
2016Based in Kakegawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADEKA CORP | 7 | 2010–2021 |
| HORIKOSHI TAKAHIROself | 6 | 2011–2016 |
| NIKON CORP | 5 | 2004–2016 |
| KAWAMOTO NAOSHI | 2 | 2011–2013 |
| ASAHI DENKA CO LTD | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Saitama, JP | 8 | 2006–2021 |
| Chofu, JP | 4 | 2004–2014 |
| Kakegawa, JP | 1 | 2016 |