Inventor
Frank Laske
Inventor
Limburg, DE
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01BMeasuring length, thickness or similar linear dimensions16%
G06TImage data processing or generation, in general8%
H01JElectric discharge tubes or discharge lamps8%
G01MTesting static or dynamic balance of machines or structures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G05BControl or regulating systems in general3%
G06FElectric digital data processing3%
G06KGraphical data reading3%
PatentTitleYear
10,533,848Metrology and control of overlay and edge placement errors202010,473,460Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals201910,474,040Systems and methods for device-correlated overlay metrology201910,337,852Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate201910,303,153Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing process201910,185,800Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor201910,141,156Measurement of overlay and edge placement errors with an electron beam column array20189,892,885'System and method for drift compensation on an electron beam based characterization tool'20189,704,238'Method for correcting position measurements for optical errors and method for determining mask writer errors'20179,424,636'Method for measuring positions of structures on a mask and thereby determining mask manufacturing errors'20169,201,312'Method for correcting position measurements for optical errors and method for determining mask writer errors'20158,804,137'Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability'20148,352,886'Method for the reproducible determination of the position of structures on a mask with a pellicle frame'20137,864,319'Device and method for determining an optical property of a mask'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2020Based in Limburg, DE· patent location history
2013–2014Patents assigned to LASKE FRANK (2)· patent assignee history
2013Patents assigned to COTTE ERIC (1)· patent assignee history
2013Patents assigned to ENKRICH CHRISTIAN (1)· patent assignee history
2013–2017Based in Weilmuenster, DE· patent location history
2014–2020Patents assigned to KLA TENCOR CORP (12)· patent assignee history
2014Patents assigned to CHOI DONGSUB (1)· patent assignee history
2018–2019Based in Weilmunster, DE· patent location history
2019Based in Weilmünster, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 12 | 2014–2020 |
| LASKE FRANKself | 2 | 2013–2014 |
| CHOI DONGSUB | 1 | 2014 |
| COTTE ERIC | 1 | 2013 |
| ENKRICH CHRISTIAN | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Limburg, DE | 7 | 2011–2020 |
| Weilmunster, DE | 3 | 2018–2019 |
| Weilmuenster, DE | 3 | 2013–2017 |
| Weilmünster, DE | 1 | 2019 |