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Inventor

Daniel F. Vona, Jr.

Inventor
Rochester, NY, US

Overview

4→
Patents
1998–2005
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps57%
H05HPlasma technique29%
G01RMeasuring electric variables14%
PatentTitleYear
6,970,700'Power delivery system'2005RE038273'Baseband RF voltage-current probe'20035,971,591'Process detection system for plasma process'19995,770,922'Baseband V-I probe'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–1999Patents assigned to ENI TECH INC (2)· patent assignee history
1998–2005Based in Rochester, NY, US· patent location history
2003–2005Patents assigned to ENI TECHNOLOGY INC (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ENI TECH INC21998–1999
ENI TECHNOLOGY INC22003–2005
Locations
LocationPatentsSpan
Rochester, New York, US41998–2005