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Inventor

Yoshinori Ohsaki

Inventor
Utsunomiya, JP

Overview

27→
Patents
1998–2019
Patent span
Physics
Primary field (CPC G)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices49%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them26%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
G01BMeasuring length, thickness or similar linear dimensions2%
G01DMeasuring not specially adapted for a specific variable2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
10,401,744Calibration method, measurement apparatus, exposure apparatus, and method of manufacturing article20199,639,008'Lithography apparatus, and article manufacturing method'20178,400,612'Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device'20138,294,875'Exposure apparatus and device fabrication method'20128,130,360'Exposure apparatus and device manufacturing method'20128,013,980'Exposure apparatus equipped with interferometer and exposure apparatus using the same'20117,787,103'Projection exposure apparatus, optical member, and device manufacturing method'20107,602,504'Exposure apparatus and device manufacturing method'20097,417,712'Exposure apparatus having interferometer and device manufacturing method'20087,403,263'Exposure apparatus'20087,330,237'Exposure apparatus equipped with interferometer and method of using same'20087,221,431'Exposure apparatus'20077,218,379'Scanning exposure apparatus and method'20077,154,582'Exposure apparatus and method'20067,148,956'Exposure method'20067,050,150'Exposure apparatus'20067,046,333'Exposure method'20066,989,885'Scanning exposure apparatus and method'20066,833,906'Projection exposure apparatus, and device manufacturing method using the same'20046,649,484'Aligning method, exposure apparatus using this aligning method, and semiconductor device manufacturing method utilizing this exposure apparatus'20036,646,714'Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method'20036,278,514'Exposure apparatus'20016,215,549'Apparatus for measuring optical characteristics'20016,088,115'Apparatus and method for measuring optical anisotropy'20006,040,909'Surface position detecting system and device manufacturing method using the same'20005,903,352'Apparatus and method for measuring optical anisotropy'19995,838,453'Apparatus and method for measuring optical anisotropy'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2019Patents assigned to CANON KK (27)· patent assignee history
1998–1999Based in Machida, JP· patent location history
2000–2019Based in Utsunomiya, JP· patent location history
2003–2008Based in Tochigi, JP· patent location history
2012–2013Patents assigned to OHSAKI YOSHINORI (3)· patent assignee history
2012Patents assigned to HIRAI SHINICHIRO (1)· patent assignee history
2012Patents assigned to MIURA SEIYA (1)· patent assignee history
2012Patents assigned to MORI TETSUYA (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK271998–2019
OHSAKI YOSHINORIself32012–2013
HIRAI SHINICHIRO12012
MIURA SEIYA12012
MORI TETSUYA12012
Locations
LocationPatentsSpan
Utsunomiya, JP152000–2019
Tochigi, JP102003–2008
Machida, JP21998–1999