Inventor
Mutsumi Tanikawa
Inventor
Tokyo, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing62%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
B01DSeparation8%
B01FMixing, e.g. dissolving, emulsifying or dispersing8%
PatentTitleYear
9,533,395'Method and apparatus for conditioning a polishing pad'20179,469,013'Method and apparatus for conditioning a polishing pad'20169,156,130'Method of adjusting profile of a polishing member used in a polishing apparatus, and polishing apparatus'20159,108,292'Method of obtaining a sliding distance distribution of a dresser on a polishing member, method of obtaining a sliding vector distribution of a dresser on a polishing member, and polishing apparatus'20156,508,695'Pure water reusing system'20036,358,125'Polishing liquid supply apparatus'20026,338,671'Apparatus for supplying polishing liquid'20026,280,300'Filter apparatus'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2017Patents assigned to EBARA CORP (8)· patent assignee history
2001Based in Kanagawa, JP· patent location history
2002–2017Based in Tokyo, JP· patent location history
2002–2003Based in Yokohama, JP· patent location history
2003Patents assigned to TOSHIBA KK (1)· patent assignee history
2016Patents assigned to SHIMANO TAKAHIRO (1)· patent assignee history
2016Patents assigned to TANIKAWA MUTSUMI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 8 | 2001–2017 |
| SHIMANO TAKAHIRO | 1 | 2016 |
| TANIKAWA MUTSUMIself | 1 | 2016 |
| TOSHIBA KK | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2002–2017 |
| Yokohama, JP | 2 | 2002–2003 |
| Kanagawa, JP | 1 | 2001 |