LexDanaLexDanabeta
Inventor

Yuichi Hamada

Inventor
Kobe, JP

Overview

59→
Patents
1994–2021
Patent span
Physics
Primary field (CPC G)

Patents· 59 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties24%
Y10TTechnical subjects covered by former us classification22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B01DSeparation2%
B01LChemical or physical laboratory apparatus for general use2%
C09JAdhesives2%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%
PatentTitleYear
10,967,362Catalyst for purification of exhaust gas from internal combustion engine and method for purification of exhaust gas using the catalyst202110,712,658Method of procuring an agglutinant structure and a method of manufacturing a pellicle including said agglutinant procuring method202010,622,531Light-emitting device202010,550,803Filter medium for filter, method for producing the same, and filter202010,338,465Pellicle frame and pellicle201910,241,393Pellicle201910,031,151Analysis device and reagent container20189,645,487'Method for bonding a pellicle, and a bonding apparatus used in this method'20179,638,709'Analysis apparatus and analysis method'20179,513,282'Sample analyzer, sample analyzing method, and sample analyzing system'20169,417,254'Analysis apparatus and measurement unit'20169,377,477'Analysis device and reagent container'20169,377,383'Specimen processing apparatus'20169,285,379'Information management apparatus and sample testing apparatus that permit functions based upon operator attributes'20169,268,914'Sample testing apparatus'20169,194,866'Sample analyzer'20159,134,331'Analyzer, sample transportation method, and computer program product'20158,968,656'Sample analyzer and non-transitory storage medium'20158,960,928'Pellicle frame'20158,956,569'Sample testing system with automated control of sample retesting'20158,920,724'Specimen processing apparatus'20148,894,931'Sample analyzer and information writing method'20148,883,078'Sample testing system and transporting apparatus'20148,865,072'Analysis apparatus and analysis method'20148,852,506'Sample analyzer and method of notifying user by the same'20148,741,219'Sample processing system, base for sample processing system, and sample processing apparatus'20148,701,508'Analyzer and transportation device'20148,663,756'Pellicle kit for manufacturing a pellicle'20148,652,848'Sample measuring apparatus and sample measuring method'20148,594,836'Sample processing system, sample processing method, and computer program product'20138,541,149'Method of adhering lithographic pellicle and adhering apparatus therefor'20138,445,165'Pellicle for lithography'20138,356,525'Analyzer and transportation device'20138,347,743'Specimen processing device and specimen processing method'20138,343,770'Analyzer and method for aspirating specimen'20138,262,994'Analyzer'20128,153,334'Method for stripping pellicle and stripping apparatus used therein'20128,147,754'Sample measuring apparatus and sample measuring method'20128,097,211'Analyzer'20128,026,023'Lithographic pellicle'20117,916,280'Blood analyzer and blood analyzing method for classifying white blood cells'20117,894,047'Blood analyzer, sample analyzer, and flow cytometer'20117,758,675'Gas treatment device'20107,580,120'Blood analyzer, sample analyzer, and flow cytometer'20097,488,560'Large pellicle'20096,436,586'Pellicle with a filter and method for production thereof'20025,965,294'Hydrogen absorbing alloy electrode'19995,723,860'Frame-supported pellicle for photomask protection'19985,693,382'Frame-supported pellicle for dustproof protection of photomask in photolithography'19975,691,088'Pellicle for protection of photolithographic mask'19975,616,927'Frame-supported pellicle for dustproof protection of photomask'19975,597,669'Frame-supported pellicle for photolithography'19975,470,621'Frame-supported pellicle for dustproof protection of photomask'19955,419,972'Frame-supported pellicle for dustproof protection of photomask'19955,378,514'Frame-supported pellicle for photolithography'19955,370,951'Frame-supported pellicle for protection of photolithographic mask'19945,368,675'Method for the preparation of a frame-supported pellicle for photolithography'19945,327,808'Method for the preparation of a frame-supported pellicle for photolithography'19945,300,348'Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2020Patents assigned to SHINETSU CHEMICAL CO (25)· patent assignee history
1994–2019Based in Gunma, JP· patent location history
1997–2019Based in Annaka, JP· patent location history
2009–2018Patents assigned to SYSMEX CORP (30)· patent assignee history
2009–2018Based in Kobe, JP· patent location history
2012–2016Patents assigned to HAMADA YUICHI (26)· patent assignee history
2012–2016Patents assigned to FUKUMA DAIGO (10)· patent assignee history
2012–2016Patents assigned to SHIBATA MASAHARU (8)· patent assignee history
2020Based in Takasaki, JP· patent location history
2021Based in Himeji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SYSMEX CORP302009–2018
HAMADA YUICHIself262012–2016
SHINETSU CHEMICAL CO251994–2020
FUKUMA DAIGO102012–2016
SHIBATA MASAHARU82012–2016
Locations
LocationPatentsSpan
Kobe, JP302009–2018
Gunma, JP171994–2019
Annaka, JP71997–2019
Himeji, JP12021
Takasaki, JP12020