Inventor

Maki Ito

Inventor

Ibaraki, JP

Overview

31→

Patents

1997–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds16%

B41JTypewriters9%

H01JElectric discharge tubes or discharge lamps8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%

G06TImage data processing or generation, in general6%

C08LCompositions of macromolecular compounds5%

C07CAcyclic or carbocyclic compounds4%

C08JWorking-up4%

C09DCoating compositions, e.g. paints, varnishes or lacquers4%

PatentTitleYear

10,699,917Resin-sealed vehicle-mounted control device2020 10,448,498In-vehicle controller2019 10,053,537High-fluidity polycarbonate copolymer, process for production highly polymerized aromatic polycarbonate resin and aromatic polycarbonate compound2018 9,822,218'Process for producing a high molecular-weight aromatic polycarbonate resin'2017 9,701,788'Method for producing branched aromatic polycarbonate resin'2017 9,546,249'Process for preparing highly polymerized aromatic polycarbonate resin'2017 9,499,661'Process for producing highly polymerized aromatic polycarbonate resin'2016 9,458,290'Process for preparing highly polymerized aromatic polycarbonate resin'2016 9,428,608'Aromatic polycarbonate resin composition'2016 9,353,216'High-fluidity polycarbonate copolymer, process for production highly polymerized aromatic polycarbonate resin and aromatic polycarbonate compound'2016 9,243,106'Method for continuous production of high molecular weight polycarbonate resin'2016 9,028,055'Nonaqueous ink composition for ink jet recording and ink jet recording method'2015 8,969,505'Process for manufacturing branched aromatic polycarbonate resin with desired degree of branching'2015 8,939,559'Non-aqueous cleaning liquid and cleaning method'2015 7,562,451'Method of manufacturing actuator device for ink jet head'2009 7,411,339'Manufacturing method of actuator device and liquid jet apparatus provided with actuator device formed by manufacturing method of the same'2008 7,357,490'Actuator device, liquid jet head and liquid jet apparatus'2008 7,320,163'Method of manufacturing an actuator device'2008 7,268,472'Piezoelectric device, liquid jetting head, ferroelectric device, electronic device and methods for manufacturing these devices'2007 7,252,354'Liquid ejecting head drive method and liquid ejection device'2007 6,919,564'Inspection method, apparatus and system for circuit pattern'2005 6,903,821'Inspection method, apparatus and system for circuit pattern'2005 6,667,381'Process for producing aliphatic polyester carbonate'2003 6,493,082'Inspection method, apparatus and system for circuit pattern'2002 6,476,913'Inspection method, apparatus and system for circuit pattern'2002 6,421,122'Inspection method, apparatus and system for circuit pattern'2002 6,359,380'Color cathode ray tube with panel glass having a different light absorption characteristic from that of at least one outer surface layer provided thereon'2002 6,018,070'Two-rings-containing phenyl ester compound and anti-perroelectric liquid crystal composition containing the same'2000 5,880,224'Aliphatic polyester carbonate and process for producing the aliphatic polyester carbonate'1999 5,728,864'Liquid crystal compound having ferrielectric phase and liquid crystal composition'1998 5,660,762'Two-rings-containing phenyl ester compound and anti-ferroelectric liquid crystal composition containing the same'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2018Patents assigned to MITSUBISHI GAS CHEMICAL CO (14)· patent assignee history

1997–2000Based in Tsukuba, JP· patent location history

1999–2018Based in Ibaraki, JP· patent location history

2002–2005Patents assigned to HITACHI LTD (6)· patent assignee history

2002–2005Based in Koganei, JP· patent location history

2007–2015Patents assigned to SEIKO EPSON CORP (8)· patent assignee history

2007–2009Based in Nagano, JP· patent location history

2015–2016Patents assigned to HARADA HIDEFUMI (2)· patent assignee history

2015–2016Patents assigned to HAYAKAWA Jun-ya (2)· patent assignee history

2016–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI GAS CHEMICAL CO	14	1997–2018
SEIKO EPSON CORP	8	2007–2015
HITACHI LTD	6	2002–2005
HARADA HIDEFUMI	2	2015–2016
HAYAKAWA Jun-ya	2	2015–2016

Locations

Location	Patents	Span
Ibaraki, JP	9	1999–2018
Tokyo, JP	5	2016–2020
Nagano, JP	5	2007–2009
Koganei, JP	5	2002–2005
Tsukuba, JP	3	1997–2000