Inventor
Chung-Heon Lee
Inventor
Uiwang-si, KR
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
C07CAcyclic or carbocyclic compounds8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
H10HInorganic light-emitting semiconductor devices having potential barriers6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
10,986,711Light-emitting apparatus including light-emitting diode202110,985,207Display device having light emitting stacked structure202110,950,653Display device having light emitting stacked structure202110,948,163Backlight unit202110,916,684Light emitting device including RGB light emitting diodes and phosphor202110,892,296Light emitting device having commonly connected LED sub-units202110,892,297Light emitting diode (LED) stack for a display202110,345,706Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition201910,312,074Method of producing layer structure, layer structure, and method of forming patterns201910,018,914Hardmask composition and method of forming patterns using the hardmask composition20189,725,389'Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition'20179,683,114'Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition'20179,665,003'Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns'20179,556,094'Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition'20179,529,257'Hard mask composition and method for forming pattern using same'20169,371,444'Hardmask composition and method of forming patterns using the hardmask composition'20169,359,276'Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition'20169,284,245'Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition'20168,952,373'Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns'20158,900,997'Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith'20148,741,540'Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern'20147,385,434'Circuit for preventing latch-up in DC-DC converter'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2019Patents assigned to CHEIL IND INC (10)· patent assignee history
2014–2017Patents assigned to LEE CHUNG-HEON (6)· patent assignee history
2014–2016Patents assigned to CHO YOUN-JIN (4)· patent assignee history
2014–2019Based in Uiwang-si, KR· patent location history
2015–2017Patents assigned to CHOI YOO-JEONG (3)· patent assignee history
2016–2019Patents assigned to SAMSUNG SDI CO LTD (4)· patent assignee history
2016–2019Based in Suwon-si, KR· patent location history
2021Based in Ansan-si, KR· patent location history
2021Based in Gyeonggi-do, KR· patent location history
2021Based in Gwangmyeong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHEIL IND INC | 10 | 2014–2019 |
| LEE CHUNG-HEONself | 6 | 2014–2017 |
| CHO YOUN-JIN | 4 | 2014–2016 |
| SAMSUNG SDI CO LTD | 4 | 2016–2019 |
| CHOI YOO-JEONG | 3 | 2015–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Uiwang-si, KR | 8 | 2014–2019 |
| Suwon-si, KR | 6 | 2016–2019 |
| Ansan-si, KR | 5 | 2021 |
| Gyeonggi-do, KR | 1 | 2021 |
| Gwangmyeong-si, KR | 1 | 2021 |